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Title: Venting temperature determines surface chemistry of magnetron sputtered TiN films

Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature T{sub v}, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that T{sub v} has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.
Authors:
 [1] ;  [2] ; ;  [3] ;  [1]
  1. Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping (Sweden)
  2. (Germany)
  3. Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany)
Publication Date:
OSTI Identifier:
22489344
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 108; Journal Issue: 4; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; MAGNETRONS; MATERIALS; REFRACTORIES; SPUTTERING; SURFACES; THIN FILMS; TITANIUM NITRIDES; TRANSITION ELEMENTS; X-RAY PHOTOELECTRON SPECTROSCOPY