Efficiency of a multilayer-Laue-lens with a 102 μm aperture

Journal Article · Mon Aug 24 00:00:00 EDT 2015 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4929505· OSTI ID:22489150

Wojcik, Michael; Maser, Jorg ^[1]; Kubec, Adam ^[1]; Conley, Raymond ^[1]; Bouet, Nathalie; Zhou, Juan ^[2]

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1. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
2. NSLS-II, Brookhaven National Laboratory, Upton, New York 11973 (United States)

A multilayer-Laue-lens (MLL) comprised of WSi{sub 2}/Al layers stacked to a full thickness of 102 μm was characterized for its diffraction efficiency and dynamical diffraction properties by x-ray measurements made in the far field. The achieved aperture roughly doubles the previous maximum reported aperture for an MLL, thereby doubling the working distance. Negative and positive first orders were found to have 14.2% and 13.0% efficiencies, respectively. A section thickness of 9.6 μm was determined from Laue-case thickness fringes in the diffraction data. A background gas consisting of 90% Ar and 10% N{sub 2} was used for sputtering. This material system was chosen to reduce grown-in stress as the multilayer is deposited. Although some regions of the full MLL exhibited defects, the presently reported results were obtained for a region devoid of defects. The data compare well to dynamical diffraction calculations with Coupled Wave Theory (CWT) which provided confirmation of the optical constants and densities assumed for the CWT calculations.

• OSTI ID: 22489150
• Journal Information: Applied Physics Letters, Vol. 107, Issue 8; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
APERTURES
COMPARATIVE EVALUATIONS
DENSITY
DEPOSITS
DIFFRACTION
DISTANCE
EFFICIENCY
LAYERS
LENSES
SPUTTERING
STRESSES
THICKNESS
TUNGSTEN SILICIDES
X RADIATION