Erratum: “Thermal transport in tantalum oxide films for memristive applications” [Appl. Phys. Lett. 107, 023108 (2015)]
- Sandia National Laboratories, Albuquerque, New Mexico 87123 (United States)
- Colorado School of Mines, Golden, Colorado 80401 (United States)
No abstract prepared.
- OSTI ID:
- 22489076
- Journal Information:
- Applied Physics Letters, Vol. 107, Issue 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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