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Title: Symmetry plays a key role in the erasing of patterned surface features

We report on how the relaxation of patterns prepared on a thin film can be controlled by manipulating the symmetry of the initial shape. The validity of a lubrication theory for the capillary-driven relaxation of surface profiles is verified by atomic force microscopy measurements, performed on films that were patterned using focused laser spike annealing. In particular, we observe that the shape of the surface profile at late times is entirely determined by the initial symmetry of the perturbation, in agreement with the theory. The results have relevance in the dynamical control of topographic perturbations for nanolithography and high density memory storage.
Authors:
; ;  [1] ; ; ;  [2] ;  [2] ;  [3]
  1. Laboratoire de Physico-Chimie Théorique, UMR CNRS Gulliver 7083, ESPCI ParisTech, PSL Research University, 75005 Paris (France)
  2. Department of Physics and Astronomy, McMaster University, Hamilton, Ontario L8S 4M1 (Canada)
  3. (France)
Publication Date:
OSTI Identifier:
22489061
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 107; Journal Issue: 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANNEALING; ATOMIC FORCE MICROSCOPY; LASERS; LUBRICATION; SHAPE; SURFACES; SYMMETRY; THIN FILMS