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Title: Electrical and optical properties of molybdenum doped zinc oxide films prepared by reactive RF magnetron sputtering

Molybdenum doped zinc oxide (MZO) films were deposited on to glass substrates held at temperatures in the range from 303 to 673 K by reactive RF magnetron sputtering method. The chemical composition, crystallographic structure and surface morphology, electrical and optical properties of the films were determined. The films contained the molybdenum of 2.7 at. % in ZnO. The films deposited at 303 K were of X-ray amorphous. The films formed at 473 K were of nanocrystalline in nature with wurtzite structure. The crystallite size of the films was increased with the increase of substrate temperature. The optical transmittance of the films was in the visible range was 80–85%. The molybdenum (2.7 at %) doped zinc oxide films deposited at substrate temperature of 573 K were of nanocrystalline with electrical resistivity of 7.2×10{sup −3} Ωcm, optical transmittance of 85 %, optical band gap of 3.35 eV and figure of merit 30.6 Ω{sup −1}cm{sup −1}.
Authors:
; ;  [1]
  1. Department of Physics, Sri Venkateswara University, Tirupati – 517 502 (India)
Publication Date:
OSTI Identifier:
22488784
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1675; Journal Issue: 1; Conference: AMRP-2015: 4. national conference on advanced materials and radiation physics, Longowal (India), 13-14 Mar 2015; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CHEMICAL COMPOSITION; CRYSTAL STRUCTURE; CRYSTALS; DOPED MATERIALS; ELECTRIC CONDUCTIVITY; EV RANGE; FILMS; MAGNETRONS; MOLYBDENUM; MORPHOLOGY; NANOSTRUCTURES; OPTICAL PROPERTIES; SPUTTERING; SUBSTRATES; SURFACES; TEMPERATURE DEPENDENCE; X RADIATION; ZINC OXIDES