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Title: Window-assisted nanosphere lithography for vacuum micro-nano-electronics

Development of vacuum micro-nano-electronics is quite important for combining the advantages of vacuum tubes and solid-state devices but limited by the prevailing fabricating techniques which are expensive, time consuming and low-throughput. In this work, window-assisted nanosphere lithography (NSL) technique was proposed and enabled the low-cost and high-efficiency fabrication of nanostructures for vacuum micro-nano-electronic devices, thus allowing potential applications in many areas. As a demonstration, we fabricated high-density field emitter arrays which can be used as cold cathodes in vacuum micro-nano-electronic devices by using the window-assisted NSL technique. The details of the fabricating process have been investigated. This work provided a new and feasible idea for fabricating nanostructure arrays for vacuum micro-nano-electronic devices, which would spawn the development of vacuum micro-nano-electronics.
Authors:
 [1] ;  [2] ; ; ; ; ; ;  [3] ;  [1] ;  [2]
  1. National Key Laboratory of Science and Technology on Vacuum Electronics, School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054 (China)
  2. (China)
  3. Institute of Electronic Engineering, Chinese Academy of Engineering Physics, Mianyang, 621900 (China)
Publication Date:
OSTI Identifier:
22488524
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 4; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; CATHODES; DENSITY; EFFICIENCY; ELECTRONIC EQUIPMENT; NANOSTRUCTURES; SOLIDS