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Title: Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma

A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanyingmore » film growth. And, the re-sputtering presents ion-induced sputtering features.« less
Authors:
; ; ;  [1] ; ;  [1] ;  [2] ;  [1] ;  [2] ;  [2]
  1. Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China)
  2. (China)
Publication Date:
OSTI Identifier:
22486473
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABLATION; ATOMIC IONS; ATOMS; CARBON NITRIDES; CRYSTAL GROWTH; CYANIDES; DEPOSITION; ELECTRIC POTENTIAL; GRAPHITE; LASER RADIATION; MOLECULAR IONS; NITROGEN; PLASMA; PULSES; RADICALS; SPATIAL DISTRIBUTION; SPUTTERING; THIN FILMS; TIME DEPENDENCE