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Title: GaN-on-diamond electronic device reliability: Mechanical and thermo-mechanical integrity

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4938002· OSTI ID:22486266
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  1. Center for Device Thermography and Reliability, H.H. Wills Physics Laboratory, University of Bristol, Bristol BS8 1TL (United Kingdom)
  2. Element-Six Technologies, Santa Clara, California 95054 (United States)

The mechanical and thermo-mechanical integrity of GaN-on-diamond wafers used for ultra-high power microwave electronic devices was studied using a micro-pillar based in situ mechanical testing approach combined with an optical investigation of the stress and heat transfer across interfaces. We find the GaN/diamond interface to be thermo-mechanically stable, illustrating the potential for this material for reliable GaN electronic devices.

OSTI ID:
22486266
Journal Information:
Applied Physics Letters, Vol. 107, Issue 25; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English