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Title: Vacuum arc plasma generation and thin film deposition from a TiB{sub 2} cathode

We have studied the utilization of TiB{sub 2} cathodes for thin film deposition in a DC vacuum arc system. We present a route for attaining a stable, reproducible, and fully ionized plasma flux of Ti and B by removal of the external magnetic field, which leads to dissipation of the vacuum arc discharge and an increased active surface area of the cathode. Applying a magnetic field resulted in instability and cracking, consistent with the previous reports. Plasma analysis shows average energies of 115 and 26 eV, average ion charge states of 2.1 and 1.1 for Ti and B, respectively, and a plasma ion composition of approximately 50% Ti and 50% B. This is consistent with measured resulting film composition from X-ray photoelectron spectroscopy, suggesting a negligible contribution of neutrals and macroparticles to the film growth. Also, despite the observations of macroparticle generation, the film surface is very smooth. These results are of importance for the utilization of cathodic arc as a method for synthesis of metal borides.
Authors:
; ; ;  [1] ; ;  [2]
  1. Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)
  2. PLANSEE Composite Materials GmbH, Siebenbürgerstraße 23, 86983 Lechbruck am See (Germany)
Publication Date:
OSTI Identifier:
22486025
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 107; Journal Issue: 18; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CATHODES; CHARGE STATES; DEPOSITION; EV RANGE; INSTABILITY; IONS; MAGNETIC FIELDS; PLASMA; SURFACE AREA; THIN FILMS; TITANIUM BORIDES; X-RAY PHOTOELECTRON SPECTROSCOPY