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Title: Background gas density and beam losses in NIO1 beam source

NIO1 (Negative Ion Optimization 1) is a versatile ion source designed to study the physics of production and acceleration of H- beams up to 60 keV. In ion sources, the gas is steadily injected in the plasma source to sustain the discharge, while high vacuum is maintained by a dedicated pumping system located in the vessel. In this paper, the three dimensional gas flow in NIO1 is studied in the molecular flow regime by the Avocado code. The analysis of the gas density profile along the accelerator considers the influence of effective gas temperature in the source, of the gas temperature accommodation by collisions at walls, and of the gas particle mass. The calculated source and vessel pressures are compared with experimental measurements in NIO1 during steady gas injection.
Authors:
; ;  [1] ;  [2]
  1. Consorzio RFX (CNR, ENEA, INFN, Università di Padova, Acciaierie Venete SpA), C.so Stati Uniti 4, 35127 Padova (Italy)
  2. INFN-LNL, v.le dell’Università 2, I-35020 Legnaro (PD) (Italy)
Publication Date:
OSTI Identifier:
22482939
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 2; Other Information: (c) 2015 EURATOM; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ANIONS; COMPARATIVE EVALUATIONS; DENSITY; GAS FLOW; GAS INJECTION; ION BEAMS; ION SOURCES; KEV RANGE 10-100; PRESSURE VESSELS