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Title: Injection of auxiliary electrons for increasing the plasma density in highly charged and high intensity ion sources

Different electron guns based on cold- or hot-cathode technologies have been developed since 2009 at INFN for operating within ECR plasma chambers as sources of auxiliary electrons, with the aim of boosting the source performances by means of a higher plasma lifetime and density. Their application to microwave discharge ion sources, where plasma is not confined, has required an improvement of the gun design, in order to “screen” the cathode from the plasma particles. Experimental tests carried out on a plasma reactor show a boost of the plasma density, ranging from 10% to 90% when the electron guns are used, as explained by plasma diffusion models.
Authors:
; ;  [1] ;  [1] ;  [2] ; ; ; ; ;  [3]
  1. INFN—Bologna, Viale B. Pichat, 6/2, 40127 Bologna (Italy)
  2. (Italy)
  3. INFN–Laboratori Nazionali del Sud, Via S. Sofia 62, 95125 Catania (Italy)
Publication Date:
OSTI Identifier:
22482899
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; CATHODES; DESIGN; ELECTRON CYCLOTRON-RESONANCE; ELECTRON GUNS; ELECTRONS; HIGH-FREQUENCY DISCHARGES; ION SOURCES; LIFETIME; PLASMA DENSITY