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Title: Note: Gratings on low absorbing substrates for x-ray phase contrast imaging

Grating based X-ray phase contrast imaging is on the verge of being applied in clinical settings. To achieve this goal, compact setups with high sensitivity and dose efficiency are necessary. Both can be increased by eliminating unwanted absorption in the beam path, which is mainly due to the grating substrates. Fabrication of gratings via deep X-ray lithography can address this issue by replacing the commonly used silicon substrate with materials with lower X-ray absorption that fulfill certain boundary conditions. Gratings were produced on both graphite and polymer substrates without compromising on structure quality. These gratings were tested in a three-grating setup with a source operated at 40 kVp and lead to an increase in the detector photon count rate of almost a factor of 4 compared to a set of gratings on silicon substrates. As the visibility was hardly affected, this corresponds to a significant increase in sensitivity and therefore dose efficiency.
Authors:
; ; ; ; ; ; ;  [1] ; ; ;  [2] ; ;  [3]
  1. Institute of Microstructure Technology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen (Germany)
  2. Lehrstuhl für Biomedizinische Physik, Physik-Department and Institut für Medizintechnik, Technische Universität München, Munich (Germany)
  3. Microworks GmbH, Karlsruhe (Germany)
Publication Date:
OSTI Identifier:
22482685
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 86; Journal Issue: 12; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ABSORPTION; BOUNDARY CONDITIONS; COUNTING RATES; DOSES; EFFICIENCY; FABRICATION; GRAPHITE; SENSITIVITY; SUBSTRATES; X RADIATION