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Title: In situ analysis of texture development from sinusoidal stress at high pressure and temperature

Here, we present a new experimental protocol to investigate the relationship between texture, plastic strain, and the mechanisms of plastic deformation at high pressure and temperature. The method utilizes synchrotron X-ray radiation as the probing tool, coupled with a large-volume high pressure deformation device (D-DIA). The intensity of X-ray diffraction peaks within the spectrum of the sample is used for sampling texture development in situ. The unique feature of this study is given by the sinusoidal variation of the intensity when a sinusoidal strain is applied to the sample. For a sample of magnesium oxide at elevated pressure and temperature, we demonstrate observations that are consistent with elasto-plastic models for texture development and for diffraction-peak measurements of apparent stress. The sinusoidal strain magnitude was 3%.
Authors:
;  [1]
  1. Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States)
Publication Date:
OSTI Identifier:
22482670
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 86; Journal Issue: 12; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; DEFORMATION; MAGNESIUM OXIDES; PLASTICITY; PRESSURE RANGE MEGA PA 10-100; PROBES; STRAINS; STRESSES; SYNCHROTRONS; TEXTURE; X RADIATION; X-RAY DIFFRACTION