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Title: Fabrication of Pt nanowires with a diffraction-unlimited feature size by high-threshold lithography

Although the nanoscale world can already be observed at a diffraction-unlimited resolution using far-field optical microscopy, to make the step from microscopy to lithography still requires a suitable photoresist material system. In this letter, we consider the threshold to be a region with a width characterized by the extreme feature size obtained using a Gaussian beam spot. By narrowing such a region through improvement of the threshold sensitization to intensity in a high-threshold material system, the minimal feature size becomes smaller. By using platinum as the negative photoresist, we demonstrate that high-threshold lithography can be used to fabricate nanowire arrays with a scalable resolution along the axial direction of the linewidth from the micro- to the nanoscale using a nanosecond-pulsed laser source with a wavelength λ{sub 0} = 1064 nm. The minimal feature size is only several nanometers (sub λ{sub 0}/100). Compared with conventional polymer resist lithography, the advantages of high-threshold lithography are sharper pinpoints of laser intensity triggering the threshold response and also higher robustness allowing for large area exposure by a less-expensive nanosecond-pulsed laser.
Authors:
; ; ; ;  [1] ; ; ; ;  [1] ;  [2] ;  [3]
  1. International Research Centre for Nano Handling and Manufacturing of China (CNM) and Joint Research Centre for Computer-Controlled Nanomanufacturing (JR3CN), Changchun University of Science and Technology, Changchun 130022 (China)
  2. (JR3CN), University of Bedfordshire, Luton LU1 3JU (United Kingdom)
  3. Department of Physics and Beijing Key Laboratory of Energy Conversion and Storage Materials, Beijing Normal University, Beijing 100875 (China)
Publication Date:
OSTI Identifier:
22482176
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 107; Journal Issue: 13; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DIFFRACTION; FABRICATION; LASERS; MASKING; NANOWIRES; OPTICAL MICROSCOPY; PLATINUM; POLYMERS; RESOLUTION; WAVELENGTHS