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Title: Substrate temperature control for the formation of metal nanohelices by glancing angle deposition

The targets of this study are to develop a device to precisely control the temperature during glancing angle deposition, to make films consisting of low melting temperature metal nanoelements with a controlled shape (helix), and to explore the substrate temperature for controlling the nanoshapes. A vacuum evaporation system capable of both cooling a substrate and measurement of its temperature was used to form thin films consisting of arrays of Cu and Al nanohelices on silicon substrates by maintaining the substrate temperature at T{sub s}/T{sub m} < 0.22 (T{sub s} is the substrate temperature and T{sub m} is the melting temperature of target material). The critical T{sub s}/T{sub m} to produce Cu and Al nanohelices corresponds to the transitional homologous temperature between zones I and II in the structure zone model for the solid film, where surface diffusion becomes dominant. X-ray diffraction analysis indicated that the Cu and Al nanohelix thin films were composed of coarse oriented grains with diameters of several tens of nanometers.
Authors:
; ; ; ;  [1] ;  [2]
  1. Department of Mechanical Engineering and Science, Kyoto University, Kyoto-daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540 (Japan)
  2. Research and Development Group, Hitachi, Ltd., 832-2, Horiguchi, Hitachinaka, Ibaraki 312-0034 (Japan)
Publication Date:
OSTI Identifier:
22479658
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 6; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; COOLING; DEPOSITION; DIFFUSION; EQUIPMENT; MELTING POINTS; METALS; SHAPE; SILICON; SOLIDS; SUBSTRATES; SURFACES; TEMPERATURE CONTROL; THIN FILMS; VACUUM EVAPORATION; X-RAY DIFFRACTION; ZONES