skip to main content

SciTech ConnectSciTech Connect

Title: Electrical and optical properties of nitrogen doped SnO{sub 2} thin films deposited on flexible substrates by magnetron sputtering

Graphical abstract: The best SnO{sub 2}:N TCO film: about 80% transmittance and 9.1 × 10{sup −4} Ω cm. - Highlights: • Nitrogen-doped tin oxide film was deposited on PET by RF-magnetron sputtering. • Effects of oxygen partial pressure on the properties of thin films were investigated. • For SnO{sub 2}:N film, visible light transmittance was 80% and electrical resistivity was 9.1 × 10{sup −4} Ω cm. - Abstract: Nitrogen-doped tin oxide (SnO{sub 2}:N) thin films were deposited on flexible polyethylene terephthalate (PET) substrates at room temperature by RF-magnetron sputtering. Effects of oxygen partial pressure (0–4%) on electrical and optical properties of thin films were investigated. Experimental results showed that SnO{sub 2}:N films were amorphous state, and O/Sn ratios of SnO{sub 2}:N films were deviated from the standard stoichiometry 2:1. Optical band gap of SnO{sub 2}:N films increased from approximately 3.10 eV to 3.42 eV as oxygen partial pressure increased from 0% to 4%. For SnO{sub 2}:N thin films deposited on PET, transmittance was about 80% in the visible light region. The best transparent conductive oxide (TCO) deposited on flexible PET substrates was SnO{sub 2}:N thin films preparing at 2% oxygen partial pressure, the transmittance was about 80% and electrical conductivitymore » was about 9.1 × 10{sup −4} Ω cm.« less
Authors:
 [1] ; ; ;  [1] ;  [2] ;  [3]
  1. School of Materials Science and Engineering, Southeast University, Nanjing 211189 (China)
  2. School of Mechanical Engineering, University of Adelaide, SA 5005 (Australia)
  3. (Australia)
Publication Date:
OSTI Identifier:
22475851
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 68; Other Information: Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; AMORPHOUS STATE; DOPED MATERIALS; ELECTRIC CONDUCTIVITY; MAGNETRONS; NITROGEN ADDITIONS; PARTIAL PRESSURE; POLYESTERS; POSITRON COMPUTED TOMOGRAPHY; SPUTTERING; STOICHIOMETRY; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIN OXIDES; VISIBLE RADIATION