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Title: Preparation and characterization of Al{sub 2x}In{sub 2−2x}O{sub 3} films deposited on MgO (1 0 0) by MOCVD

Highlights: • Ternary Al{sub 2x}In{sub 2−2x}O{sub 3} alloy films were deposited on MgO (1 0 0) by MOCVD. • The microstructure of the Al{sub 2x}In{sub 2−2x}O{sub 3} films were studied upon HRTEM. • Al{sub 2x}In{sub 2−2x}O{sub 3} alloy films exhibited great optical transparency in the visible wavelength range. • The band gap of the Al{sub 2x}In{sub 2−2x}O{sub 3} films can be modulated by controlling the Al contents in the samples. - Abstract: The ternary Al{sub 2x}In{sub 2−2x}O{sub 3} films with different compositions x[Al/(Al + In) atomic ratio] have been fabricated on the MgO (1 0 0) substrates by the metal organic chemical vapor deposition (MOCVD) method. The influence of different Al contents on the structural, optical and electrical properties of Al{sub 2x}In{sub 2−2x}O{sub 3} films has been studied. The structural studies reveal a change from single crystalline structure of cubic In{sub 2}O{sub 3} to amorphous as the Al content increases. The average transmittances of all samples in the visible range are over 80%. The optical band gap is observed to increase monotonically from 3.67 to 5.38 eV as the Al content increases from 0.1 to 0.9.
Authors:
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Publication Date:
OSTI Identifier:
22475811
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 67; Other Information: Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALLOYS; ALUMINIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; INDIUM COMPOUNDS; INDIUM OXIDES; MAGNESIUM OXIDES; MICROSTRUCTURE; MONOCRYSTALS; OPACITY; ORGANOMETALLIC COMPOUNDS; OXYGEN COMPOUNDS; SUBSTRATES; TERNARY ALLOY SYSTEMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY