skip to main content

SciTech ConnectSciTech Connect

Title: Plasma decay in high-voltage nanosecond discharges in oxygen-containing mixtures

Plasma decay in high-voltage nanosecond discharges in CO{sub 2}: O{sub 2} and Ar: O{sub 2} mixtures at room gas temperature and a pressure of 10 Torr is studied experimentally and theoretically. The time dependence of the electron density during plasma decay is measured using microwave interferometry. The time evolution of the charged particle density, ion composition, and electron temperature is simulated numerically. It is shown that, under the given conditions, the discharge plasma is dominated for the most time by O{sub 2}{sup +} ions and plasma decay is determined by dissociative and three-body electron−ion recombination. As in the previous studies performed for air and oxygen plasmas, agreement between measurements and calculations is achieved only under the assumption that the rate of three-body recombination of molecular ions is much greater than that for atomic ions. The values of the rate constant of three-body recombination of electrons with O{sub 2}{sup +} ions in a wide range of electron temperatures (500–5500 K), as well as for thermal (300 K) electrons, are obtained by processing the experimental results.
Authors:
;  [1] ;  [2] ;  [1] ;  [3]
  1. Moscow Institute of Physics and Technology (Russian Federation)
  2. Troitsk Institute for Innovation and Fusion Research (Russian Federation)
  3. Princeton University (United States)
Publication Date:
OSTI Identifier:
22471834
Resource Type:
Journal Article
Resource Relation:
Journal Name: Plasma Physics Reports; Journal Volume: 42; Journal Issue: 1; Other Information: Copyright (c) 2016 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ATOMIC IONS; CARBON DIOXIDE; COMPUTERIZED SIMULATION; ELECTRIC POTENTIAL; ELECTRON DENSITY; ELECTRON TEMPERATURE; ELECTRONS; INTERFEROMETRY; ION DENSITY; MICROWAVE RADIATION; MOLECULAR IONS; OXYGEN; PLASMA; PLASMA SIMULATION; RECOMBINATION; TIME DEPENDENCE