Growth of EuO/Si and EuO/SrO/Si heteroepitaxial structures by molecular-beam epitaxy
- National Research Center “Kurchatov Institute” (Russian Federation)
Epitaxial EuO thin films with thickness up to 60 nm have been grown by molecular beam epitaxy both on SrO sublayers and directly on Si (001) substrates. Crystal structure has been controlled in situ by reflection high energy electron diffraction. Ex situ studies by X-ray diffraction and Rutherford backscattering have confirmed high crystalline quality of the films.
- OSTI ID:
- 22470057
- Journal Information:
- Semiconductors, Vol. 49, Issue 1; Other Information: Copyright (c) 2015 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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