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Title: Structural properties of ZnO:Al films produced by the sol–gel technique

ZnO:Al films are produced by sol–gel deposition at temperatures of 350–550°C, using different types of reagents. Atomic-force microscopy, X-ray diffraction analysis, Raman spectroscopy, and optical transmittance measurements are used to study the dependence of the structural, morphological, and optical properties of the ZnO:Al coatings on the conditions of deposition. The optical conditions for the production of ZnO:Al layers with preferred orientation in the [001] direction and distinguished by small surface roughness are established. The layers produced in the study possess optical transmittance at a level of up to 95% in a wide spectral range and can be used in optoelectronic devices.
Authors:
;  [1] ; ;  [2] ;  [3]
  1. National Academy of Sciences of Belarus, Scientific and Practical Materials Research Center (Belarus)
  2. Gomel State University (Belarus)
  3. State Research Institute Center for Physical Sciences and Technology (Lithuania)
Publication Date:
OSTI Identifier:
22469731
Resource Type:
Journal Article
Resource Relation:
Journal Name: Semiconductors; Journal Volume: 49; Journal Issue: 10; Other Information: Copyright (c) 2015 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; COATINGS; CRYSTAL STRUCTURE; DEPOSITION; FILMS; GRAIN ORIENTATION; LAYERS; OPACITY; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; RAMAN SPECTROSCOPY; REAGENTS; ROUGHNESS; SOL-GEL PROCESS; SURFACES; TEMPERATURE DEPENDENCE; X-RAY DIFFRACTION; ZINC OXIDES