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Title: Electron conductivity in GeTe and GeSe upon ion implantation of Bi

This paper presents results on ion implantation of bismuth in GeTe and GeSe films. The conductivity and the thermopower of amorphous chalcogenide films are investigated. Electron conductivity in the films is attained at the Bi implantation doses higher than (1.5–2) × 10{sup 16} cm{sup −2}. In conjunction with the structural modification in the films as revealed Raman spectroscopy, the results suggest the structural re-arrangement of the amorphous network occurs via weakening the bonds of a lower energy. The onset of electron conductivity is hindered by a stronger bond in an alloy. In GeTe, this is the Ge-Ge bond.
Authors:
 [1]
  1. University of Surrey, Advanced Technology Institute, Department of Electronic Engineering (United Kingdom)
Publication Date:
OSTI Identifier:
22469671
Resource Type:
Journal Article
Resource Relation:
Journal Name: Semiconductors; Journal Volume: 49; Journal Issue: 12; Other Information: Copyright (c) 2015 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; AMORPHOUS STATE; BISMUTH; BISMUTH IONS; CHEMICAL BONDS; ELECTRIC CONDUCTIVITY; ELECTRONS; FILMS; GERMANIUM SELENIDES; GERMANIUM TELLURIDES; ION IMPLANTATION; MODIFICATIONS; RAMAN SPECTROSCOPY