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Title: Enhancement of the barrier performance in organic/inorganic multilayer thin-film structures by annealing of the parylene layer

Highlights: • High performance thin-film barrier structure for encapsulation was fabricated. • By annealing parylene in encapsulation structure, the barrier performance was improved. • The effective water vapor transmission rate is 7.2 ± 3.0 × 10{sup −6} g/m{sup 2}/day. - Abstract: A multilayered barrier structure was fabricated by chemical vapor deposition of parylene and subsequent plasma-enhanced chemical vapor deposition of SiO{sub x} or SiN{sub x}. The barrier performance against water vapor ingress was significantly improved by annealing the parylene layer before the deposition of either SiO{sub x} or SiN{sub x}. The mechanism of this enhancement was investigated using atomic force microscopy, Raman spectroscopy, and X-ray diffraction. The surface roughness of the parylene before the deposition of either SiO{sub x} or SiN{sub x} was found to correlate closely with the barrier performance of the multilayered structures. In addition, removing absorbed water vapor in the film by annealing results in a lower water vapor transmission rate in the transient region and a longer lag time. Annealing the parylene leads to a large decrease in the effective water vapor transmission rate, which reaches 7.2 ± 3.0 × 10{sup −6} g/m{sup 2}/day.
Authors:
 [1] ;  [2] ;  [1] ;  [3] ;  [4]
  1. George W. Woodruff School of Mechanical Engineering, 801 Ferst Drive, Georgia Institute of Technology, Atlanta, GA 30332 (United States)
  2. (Korea, Republic of)
  3. (United States)
  4. Mechanical and Aerospace Engineering, University of California at San Diego (UCSD), 9500 Gilman Drive, La Jolla, CA 92093-0411 (United States)
Publication Date:
OSTI Identifier:
22420575
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 58; Conference: IFFM2013: International forum on functional materials, Jeju City (Korea, Republic of), 27-29 Jun 2013; Other Information: Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; LAYERS; MICROSTRUCTURE; ORGANIC POLYMERS; RAMAN SPECTROSCOPY; ROUGHNESS; SILICON OXIDES; SURFACES; THIN FILMS; TRANSIENTS; WATER VAPOR; X-RAY DIFFRACTION