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Title: Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

Plasmonic lithography has been used in nanofabrication because of its utility beyond the diffraction limit. The resolution of plasmonic lithography depends on the nano-gap between the nanoaperture and the photoresist surface—changing the gap distance can modulate the line-width of the pattern. In this letter, we demonstrate solid-immersion lens based active non-contact plasmonic lithography, applying a range of gap conditions to modulate the line-width of the pattern. Using a solid-immersion lens-based near-field control system, the nano-gap between the exit surface of the nanoaperture and the media can be actively modulated and maintained to within a few nanometers. The line-widths of the recorded patterns using 15- and 5-nm gaps were 47 and 19.5 nm, respectively, which matched closely the calculated full-width at half-maximum. From these results, we conclude that changing the nano-gap within a solid-immersion lens-based plasmonic head results in varying line-width patterns.
Authors:
; ; ; ; ; ; ;  [1] ; ; ;  [2]
  1. School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749 (Korea, Republic of)
  2. Center for Information Storage Device, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22420237
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CONTROL SYSTEMS; FABRICATION; LINE WIDTHS; NANOSTRUCTURES; PLASMONS; RESOLUTION; SURFACES