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Title: Stopping potential and ion beamlet control for micro-resistive patterning through sub-Debye length plasma apertures

Focused multiple ion beamlets from a microwave plasma source is investigated for localized micron-scale modification of substrates in a patterned manner. Plasma electrodes (PE) with an array of through apertures having aperture diameters of the order of plasma Debye length are investigated for generating the beamlets. Extraction through sub-Debye length apertures becomes possible when the PE is kept at floating potential. It is found that the current – voltage characteristics of the extracted beamlets exhibits interesting features such as a space-charge-limited region that has a different behaviour than the conventional Child-Langmuir’s law and an extraction-voltage-limited region that does not undergo saturation but exhibits a Schottky-like behaviour similar to that of a vacuum diode. A switching technique to control the motion of individual beamlets is developed and the stopping potential determined. The beamlets are thereafter used to create localized micro-resistive patterns. The experimental results are compared with simulations and reasonably good agreement is obtained.
Authors:
; ; ;  [1]
  1. Department of Physics, Indian Institute of Technology, Kanpur 208016 (India)
Publication Date:
OSTI Identifier:
22420207
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 4; Journal Issue: 12; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; APERTURES; CONTROL; DEBYE LENGTH; ELECTRIC POTENTIAL; ELECTRODES; EXTRACTION; MICROWAVE RADIATION; PLASMA; SIMULATION; SPACE CHARGE; SUBSTRATES