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Title: Transition in electron scattering mechanism in atomic layer deposited Nb:TiO{sub 2} thin films

We characterized transport and optical properties of atomic layer deposited Nb:TiO{sub 2} thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10{sup −3 }Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.
Authors:
;  [1] ; ;  [2] ;  [3] ;  [3]
  1. Department of Chemistry, Aalto University, FI-00076 Aalto (Finland)
  2. Department of Chemistry, The University of Tokyo, Tokyo 113-0033 (Japan)
  3. (Japan)
Publication Date:
OSTI Identifier:
22415189
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DEPOSITION; GRAIN BOUNDARIES; GRAIN SIZE; HALL EFFECT; LAYERS; NIOBIUM; OPTICAL PROPERTIES; SCATTERING; SUBSTRATES; TEMPERATURE RANGE 0000-0013 K; TEMPERATURE RANGE 0013-0065 K; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TITANIUM OXIDES