skip to main content

SciTech ConnectSciTech Connect

Title: Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires

A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices.
Authors:
; ; ; ; ; ;  [1] ;  [1] ;  [2] ; ; ;  [1] ;  [2]
  1. Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China)
  2. (China)
Publication Date:
OSTI Identifier:
22415181
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CADMIUM SULFIDES; DESORPTION; LASERS; MATHEMATICAL SOLUTIONS; MICROSTRUCTURE; NANOWIRES; SEMICONDUCTOR MATERIALS; SUBSTRATES