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Title: Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO{sub 2}/TiN devices

Abstract

Recently proposed novel neural network hardware designs imply the use of memristors as electronic synapses in 3D cross-bar architecture. Atomic layer deposition (ALD) is the most feasible technique to fabricate such arrays. In this work, we present the results of the detailed investigation of the gradual resistive switching (memristive) effect in nanometer thick fully ALD grown TiN/HfO{sub 2}/TiN stacks. The modelling of the I-V curves confirms interface limited trap-assisted-tunneling mechanism along the oxygen vacancies in HfO{sub 2} in all conduction states. The resistivity of the stack is found to critically depend upon the distance from the interface to the first trap in HfO{sub 2}. The memristive properties of ALD grown TiN/HfO{sub 2}/TiN devices are correlated with the demonstrated neuromorphic functionalities, such as long-term potentiation/depression and spike-timing dependent plasticity, thus indicating their potential as electronic synapses in neuromorphic hardware.

Authors:
;  [1]; ;  [1]
  1. Moscow Institute of Physics and Technology, 141700 Moscow Region (Russian Federation)
Publication Date:
OSTI Identifier:
22413005
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ELECTRIC CONDUCTIVITY; HAFNIUM OXIDES; INTERFACES; NEURAL NETWORKS; OXYGEN; PLASTICITY; TITANIUM NITRIDES; TUNNEL EFFECT; VACANCIES

Citation Formats

Matveyev, Yu., Zenkevich, A., NRNU “Moscow Engineering Physics Institute”, 115409 Moscow, Egorov, K., and Markeev, A. Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO{sub 2}/TiN devices. United States: N. p., 2015. Web. doi:10.1063/1.4905792.
Matveyev, Yu., Zenkevich, A., NRNU “Moscow Engineering Physics Institute”, 115409 Moscow, Egorov, K., & Markeev, A. Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO{sub 2}/TiN devices. United States. https://doi.org/10.1063/1.4905792
Matveyev, Yu., Zenkevich, A., NRNU “Moscow Engineering Physics Institute”, 115409 Moscow, Egorov, K., and Markeev, A. 2015. "Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO{sub 2}/TiN devices". United States. https://doi.org/10.1063/1.4905792.
@article{osti_22413005,
title = {Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO{sub 2}/TiN devices},
author = {Matveyev, Yu. and Zenkevich, A. and NRNU “Moscow Engineering Physics Institute”, 115409 Moscow and Egorov, K. and Markeev, A.},
abstractNote = {Recently proposed novel neural network hardware designs imply the use of memristors as electronic synapses in 3D cross-bar architecture. Atomic layer deposition (ALD) is the most feasible technique to fabricate such arrays. In this work, we present the results of the detailed investigation of the gradual resistive switching (memristive) effect in nanometer thick fully ALD grown TiN/HfO{sub 2}/TiN stacks. The modelling of the I-V curves confirms interface limited trap-assisted-tunneling mechanism along the oxygen vacancies in HfO{sub 2} in all conduction states. The resistivity of the stack is found to critically depend upon the distance from the interface to the first trap in HfO{sub 2}. The memristive properties of ALD grown TiN/HfO{sub 2}/TiN devices are correlated with the demonstrated neuromorphic functionalities, such as long-term potentiation/depression and spike-timing dependent plasticity, thus indicating their potential as electronic synapses in neuromorphic hardware.},
doi = {10.1063/1.4905792},
url = {https://www.osti.gov/biblio/22413005}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 4,
volume = 117,
place = {United States},
year = {Wed Jan 28 00:00:00 EST 2015},
month = {Wed Jan 28 00:00:00 EST 2015}
}