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Title: Investigation of the mechanism of impurity assisted nanoripple formation on Si induced by low energy ion beam erosion

A detailed mechanism of the nanoripple pattern formation on Si substrates generated by the simultaneous incorporation of pure Fe impurities at low energy (1‚ÄČkeV) ion beam erosion has been studied. To understand and clarify the mechanism of the pattern formation, a comparative analysis of the samples prepared for various ion fluence values using two complimentary methods for nanostructure analysis, atomic force microscopy, and grazing incidence small angle x-ray scattering has been done. We observed that phase separation of the metal silicide formed during the erosion does not precede the ripple formation. It rather concurrently develops along with the ripple structure. Our work is able to differentiate among various models existing in the literature and provides an insight into the mechanism of pattern formation under ion beam erosion with impurity incorporation.
Authors:
 [1] ;  [2] ;  [3] ;  [1] ;  [4]
  1. Photon Science, DESY, Notkestr. 85, D-22607 Hamburg (Germany)
  2. (India)
  3. Amity Center for Spintronic Materials, Amity University, Sector 125, Noida 201313 (India)
  4. UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017 (India)
Publication Date:
OSTI Identifier:
22412832
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; EROSION; IMPURITIES; ION BEAMS; IRON; KEV RANGE; NANOSTRUCTURES; SILICIDES; SILICON; SMALL ANGLE SCATTERING; SUBSTRATES; X-RAY DIFFRACTION