An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas

Liu, Wen-Yao; Xu, Yong; Peng, Fei; Guo, Qian; Li, Xiao-Song; Zhu, Ai-Min; Liu, Yong-Xin; Wang, You-Nian

doi:10.1063/1.4905953

Title: An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas

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Abstract

An tunable diode laser absorption spectroscopy has been used to determine the Ar*({sup 3}P{sub 2}) and Ar*({sup 3}P{sub 0}) metastable atoms densities in dual-frequency capacitively coupled plasmas. The effects of different control parameters, such as high-frequency power, gas pressure and content of Ar, on the densities of two metastable atoms and electron density were discussed in single-frequency and dual-frequency Ar discharges, respectively. Particularly, the effects of the pressure on the axial profile of the electron and Ar metastable state densities were also discussed. Furthermore, a simple rate model was employed and its results were compared with experiments to analyze the main production and loss processes of Ar metastable states. It is found that Ar metastable state is mainly produced by electron impact excitation from the ground state, and decayed by diffusion and collision quenching with electrons and neutral molecules. Besides, the addition of CF{sub 4} was found to significantly increase the metastable destruction rate by the CF{sub 4} quenching, especially for large CF{sub 4} content and high pressure, it becomes the dominant depopulation process.

Authors:

Liu, Wen-Yao; Xu, Yong; Peng, Fei; Guo, Qian; Li, Xiao-Song; Zhu, Ai-Min ^[1]; Liu, Yong-Xin; Wang, You-Nian ^[1]

Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)

Publication Date:: Wed Jan 14 00:00:00 EST 2015

OSTI Identifier:: 22412816

Resource Type:: Journal Article

Journal Name:: Journal of Applied Physics

Additional Journal Information:: Journal Volume: 117; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABSORPTION SPECTROSCOPY; ARGON; ATOMS; CARBON TETRAFLUORIDE; COMPARATIVE EVALUATIONS; DIFFUSION; ELECTRON COLLISIONS; ELECTRON DENSITY; ELECTRONS; EXCITATION; GROUND STATES; LASER RADIATION; METASTABLE STATES; MOLECULES; PLASMA; QUENCHING

Citation Formats


                    Liu, Wen-Yao, Xu, Yong, Peng, Fei, Guo, Qian, Li, Xiao-Song, Zhu, Ai-Min, Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liu, Yong-Xin, and Wang, You-Nian. An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas.  United States: N. p., 2015. 
        Web.  doi:10.1063/1.4905953.

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                    Liu, Wen-Yao, Xu, Yong, Peng, Fei, Guo, Qian, Li, Xiao-Song, Zhu, Ai-Min, Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liu, Yong-Xin, & Wang, You-Nian. An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas.  United States.  https://doi.org/10.1063/1.4905953

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                    Liu, Wen-Yao, Xu, Yong, Peng, Fei, Guo, Qian, Li, Xiao-Song, Zhu, Ai-Min, Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liu, Yong-Xin, and Wang, You-Nian. 2015.  
        "An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas".  United States.  https://doi.org/10.1063/1.4905953.

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@article{osti_22412816,

  title        = {An investigation of Ar metastable state density in low pressure dual-frequency capacitively coupled argon and argon-diluted plasmas},

  author       = {Liu, Wen-Yao and Xu, Yong and Peng, Fei and Guo, Qian and Li, Xiao-Song and Zhu, Ai-Min and Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024 and Liu, Yong-Xin and Wang, You-Nian},

  abstractNote = {An tunable diode laser absorption spectroscopy has been used to determine the Ar*({sup 3}P{sub 2}) and Ar*({sup 3}P{sub 0}) metastable atoms densities in dual-frequency capacitively coupled plasmas. The effects of different control parameters, such as high-frequency power, gas pressure and content of Ar, on the densities of two metastable atoms and electron density were discussed in single-frequency and dual-frequency Ar discharges, respectively. Particularly, the effects of the pressure on the axial profile of the electron and Ar metastable state densities were also discussed. Furthermore, a simple rate model was employed and its results were compared with experiments to analyze the main production and loss processes of Ar metastable states. It is found that Ar metastable state is mainly produced by electron impact excitation from the ground state, and decayed by diffusion and collision quenching with electrons and neutral molecules. Besides, the addition of CF{sub 4} was found to significantly increase the metastable destruction rate by the CF{sub 4} quenching, especially for large CF{sub 4} content and high pressure, it becomes the dominant depopulation process.},

  doi          = {10.1063/1.4905953},

  url          = {https://www.osti.gov/biblio/22412816},
  journal      = {Journal of Applied Physics},

  issn         = {0021-8979},

  number       = 2,

  volume       = 117,

  place        = {United States},

  year         = {Wed Jan 14 00:00:00 EST 2015},

  month        = {Wed Jan 14 00:00:00 EST 2015}

}

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