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Title: Ferroelectric switching of poly(vinylidene difluoride-trifluoroethylene) in metal-ferroelectric-semiconductor non-volatile memories with an amorphous oxide semiconductor

Ferroelectric polarization switching of poly(vinylidene difluoride-trifluoroethylene) is investigated in different thin-film device structures, ranging from simple capacitors to dual-gate thin-film transistors (TFT). Indium gallium zinc oxide, a high mobility amorphous oxide material, is used as semiconductor. We find that the ferroelectric can be polarized in both directions in the metal-ferroelectric-semiconductor (MFS) structure and in the dual-gate TFT under certain biasing conditions, but not in the single-gate thin-film transistors. These results disprove the common belief that MFS structures serve as a good model system for ferroelectric polarization switching in thin-film transistors.
Authors:
 [1] ;  [2] ; ;  [1]
  1. Holst Centre/TNO, High Tech Campus 31, 5656 AE Eindhoven (Netherlands)
  2. (Netherlands)
Publication Date:
OSTI Identifier:
22412776
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 9; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CAPACITORS; CARRIER MOBILITY; FERROELECTRIC MATERIALS; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; POLARIZATION; SEMICONDUCTOR MATERIALS; THIN FILMS; TRANSISTORS; VOLATILITY; ZINC OXIDES