Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate
Abstract
Inversion-mode GaAs wave-shaped metal-oxide-semiconductor field-effect transistors (WaveFETs) are demonstrated using atomic-layer epitaxy of La{sub 2}O{sub 3} as gate dielectric on (111)A nano-facets formed on a GaAs (100) substrate. The wave-shaped nano-facets, which are desirable for the device on-state and off-state performance, are realized by lithographic patterning and anisotropic wet etching with optimized geometry. A well-behaved 1 μm gate length GaAs WaveFET shows a maximum drain current of 64 mA/mm, a subthreshold swing of 135 mV/dec, and an I{sub ON}/I{sub OFF} ratio of greater than 10{sup 7}.
- Authors:
-
- Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138 (United States)
- Department of Physics, Purdue University, West Lafayette, Indiana 47907 (United States)
- School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907 (United States)
- Publication Date:
- OSTI Identifier:
- 22412668
- Resource Type:
- Journal Article
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Volume: 106; Journal Issue: 7; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANISOTROPY; CRYSTAL STRUCTURE; DIELECTRIC MATERIALS; EPITAXY; ETCHING; GALLIUM ARSENIDES; LANTHANUM OXIDES; LAYERS; MOSFET; PERFORMANCE; SEMICONDUCTOR MATERIALS; SUBSTRATES
Citation Formats
Zhang, Jingyun, Si, Mengwei, Wu, Heng, Ye, Peide D., E-mail: yep@purdue.edu, Lou, Xiabing, Gordon, Roy G., Shao, Jiayi, Manfra, Michael J., Department of Physics, Purdue University, West Lafayette, Indiana 47907, and School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907. Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate. United States: N. p., 2015.
Web. doi:10.1063/1.4913431.
Zhang, Jingyun, Si, Mengwei, Wu, Heng, Ye, Peide D., E-mail: yep@purdue.edu, Lou, Xiabing, Gordon, Roy G., Shao, Jiayi, Manfra, Michael J., Department of Physics, Purdue University, West Lafayette, Indiana 47907, & School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907. Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate. United States. https://doi.org/10.1063/1.4913431
Zhang, Jingyun, Si, Mengwei, Wu, Heng, Ye, Peide D., E-mail: yep@purdue.edu, Lou, Xiabing, Gordon, Roy G., Shao, Jiayi, Manfra, Michael J., Department of Physics, Purdue University, West Lafayette, Indiana 47907, and School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907. 2015.
"Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate". United States. https://doi.org/10.1063/1.4913431.
@article{osti_22412668,
title = {Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate},
author = {Zhang, Jingyun and Si, Mengwei and Wu, Heng and Ye, Peide D., E-mail: yep@purdue.edu and Lou, Xiabing and Gordon, Roy G. and Shao, Jiayi and Manfra, Michael J. and Department of Physics, Purdue University, West Lafayette, Indiana 47907 and School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907},
abstractNote = {Inversion-mode GaAs wave-shaped metal-oxide-semiconductor field-effect transistors (WaveFETs) are demonstrated using atomic-layer epitaxy of La{sub 2}O{sub 3} as gate dielectric on (111)A nano-facets formed on a GaAs (100) substrate. The wave-shaped nano-facets, which are desirable for the device on-state and off-state performance, are realized by lithographic patterning and anisotropic wet etching with optimized geometry. A well-behaved 1 μm gate length GaAs WaveFET shows a maximum drain current of 64 mA/mm, a subthreshold swing of 135 mV/dec, and an I{sub ON}/I{sub OFF} ratio of greater than 10{sup 7}.},
doi = {10.1063/1.4913431},
url = {https://www.osti.gov/biblio/22412668},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 7,
volume = 106,
place = {United States},
year = {Mon Feb 16 00:00:00 EST 2015},
month = {Mon Feb 16 00:00:00 EST 2015}
}
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