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Title: Self-regulated growth of LaVO{sub 3} thin films by hybrid molecular beam epitaxy

LaVO{sub 3} thin films were grown on SrTiO{sub 3} (001) by hybrid molecular beam epitaxy. A volatile metalorganic precursor, vanadium oxytriisopropoxide (VTIP), and elemental La were co-supplied in the presence of a molecular oxygen flux. By keeping the La flux fixed and varying the VTIP flux, stoichiometric LaVO{sub 3} films were obtained for a range of cation flux ratios, indicating the presence of a self-regulated growth window. Films grown under stoichiometric conditions were found to have the largest lattice parameter, which decreased monotonically with increasing amounts of excess La or V. Energy dispersive X-ray spectroscopy and Rutherford backscattering measurements were carried out to confirm film compositions. Stoichiometric growth of complex vanadate thin films independent of cation flux ratios expands upon the previously reported self-regulated growth of perovskite titanates using hybrid molecular beam epitaxy, thus demonstrating the general applicability of this growth approach to other complex oxide materials, where a precise control over film stoichiometry is demanded by the application.
Authors:
;  [1] ; ;  [2] ;  [3]
  1. Department of Materials Science and Engineering and Materials Research Institute, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
  2. Department of Materials Science and Engineering, University of California, Berkeley, California 94720 (United States)
  3. (United States)
Publication Date:
OSTI Identifier:
22412561
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 23; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; LANTHANUM COMPOUNDS; LATTICE PARAMETERS; MOLECULAR BEAM EPITAXY; OXYGEN; PEROVSKITE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; STRONTIUM TITANATES; THIN FILMS; VANADIUM OXIDES; X-RAY SPECTROSCOPY