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Title: Exploring the wake of a dust particle by a continuously approaching test grain

The structure of the ion wake behind a dust particle in the plasma sheath of an rf discharge is studied in a two-particle system. The wake formation leads to attractive forces between the negatively charged dust and can cause a reduction of the charge of a particle. By evaluating the dynamic response of the particle system to small external perturbations, these quantities can be measured. Plasma inherent etching processes are used to achieve a continuous mass loss and hence an increasing levitation height of the lower particle, so that the structure of the wake of the upper particle, which is nearly unaffected by etching, can be probed. The results show a significant modification of the wake structure in the plasma sheath to one long potential tail.
Authors:
; ; ;  [1] ;  [2]
  1. IEAP, Christian-Albrechts-Universit├Ąt, D-24098 Kiel (Germany)
  2. ABB Switzerland Ltd., CH-5405 Baden-Daettwil (Switzerland)
Publication Date:
OSTI Identifier:
22410360
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CHARGED PARTICLES; DISTURBANCES; DUSTS; ETCHING; HEIGHT; LEVITATION; MASS TRANSFER; PARTICLES; PLASMA SHEATH