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Title: Particle modelling of magnetically confined oxygen plasma in low pressure radio frequency discharge

The main objective of this paper is the modelling and simulation of a radio frequency (RF) discharge in oxygen at low pressure and at room temperature, including the effect of crossed electric and magnetic fields for generation and confinement of oxygen plasma. The particle model takes into account one axial dimension along the electric field axis and three velocity components during the Monte Carlo treatment of the collisions between charged particles and background gas. The simulation by this developed code allows us not only to determine the electrodynamics characteristics of the RF discharge, but also to obtain kinetics and energetic description of reactive oxygen plasma at low pressure. These information are very important for the control of the deep reactive-ion etching technology of the silicon to manufacture capacitors with high density and for the deposition thick insulating films or thick metal to manufacture micro-coils. The simulation conditions are as follows: RF peak voltage of 200 V, frequency of 13.56 MHz, crossed magnetic field varying from 0 to 50 Gauss, and oxygen pressure of 13.8 Pa. In the presence of magnetic field, the results show an increase of the plasma density, a decrease of the electron mean energy, and also a reduction ofmore » the ratio between electron density and positive ion density. Finally in order to validate, the results are successfully compared with measurements already carried out in the literature. The conditions of comparison are from 100 to 300 V of the peak voltage at 13.56 MHz under a pressure of 13.8 Pa and a gap distance of 2.5 cm.« less
Authors:
 [1] ;  [2]
  1. Laboratoire Génie Electrique et Energie Renouvelables, Chlef University (Algeria)
  2. Université de de Toulouse, LAPLACE, UMR CNRS 5213, 118 Route de Narbonne, Toulouse 31062 (France)
Publication Date:
OSTI Identifier:
22410275
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 1; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CAPACITORS; CATIONS; COMPARATIVE EVALUATIONS; COMPUTERIZED SIMULATION; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRICAL INSULATORS; ELECTRODYNAMICS; ELECTRON DENSITY; ETCHING; KHZ RANGE 01-100; MAGNETIC FIELDS; METALS; MONTE CARLO METHOD; OXYGEN; PLASMA CONFINEMENT; PLASMA DENSITY; RADIOWAVE RADIATION; SILICON; TEMPERATURE RANGE 0273-0400 K; THIN FILMS