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Title: Ion energy-angle distribution functions at the plasma-material interface in oblique magnetic fields

The ion energy-angle distribution (IEAD) at the wall of a magnetized plasma is of fundamental importance for the determination of the material processes occurring at the plasma-material interface, comprising secondary emissions and material sputtering. Here, we present a numerical characterization of the IEAD at the wall of a weakly collisional magnetized plasma with the magnetic field inclined at an arbitrary angle with respect to the wall. The analysis has been done using two different techniques: (1) a fluid-Monte Carlo method, and (2) particle-in-cell simulations, the former offering a fast but approximate method for the determination of the IEADs, the latter giving a computationally intensive but self-consistent treatment of the plasma behavior from the quasi-neutral region to the material boundary. The two models predict similar IEADs, whose similarities and differences are discussed. Data are presented for magnetic fields inclined at angles from normal to grazing incidence (0°–85°). We show the scaling factors of the average and peak ion energy and trends of the pitch angle at the wall as a function of the magnetic angle, for use in the correlation of fluid plasma models to material models.
Authors:
;  [1]
  1. Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois at Urbana Champaign, Urbana, Illinois 61801 (United States)
Publication Date:
OSTI Identifier:
22408364
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANGULAR DISTRIBUTION; COMPUTERIZED SIMULATION; DISTRIBUTION FUNCTIONS; FIRST WALL; FLOW MODELS; INCIDENCE ANGLE; INCLINATION; IONS; MAGNETIC FIELDS; MONTE CARLO METHOD; PLASMA; SECONDARY EMISSION; SPUTTERING