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Title: A hybrid model for simulation of secondary electron emission in plasma immersion ion implantation under different pulse rise time

A hybrid fluid Particle in Cell–Monte Carlo Collision (PiC–MCC) model is presented to study the effect of secondary electron emission on the plasma immersion ion implantation process under different pulse rise time. The model describes the temporal evolution of various parameters of plasma such as ion density, ion velocity, secondary electron density, and secondary electron current for different rise times. A 3D–3 V PiC–MCC model is developed to simulate the secondary electrons which are emitted from the sample surface while the plasma ions and electrons are treated using a 1D fluid model. The simulation results indicate that the secondary electron density and secondary electron current increase as the rise time decreases. The main differences between the results for different rise times are found during the initial phase of the pulse. The results are explained through studying the fundamental parameters of plasma.
Authors:
;  [1]
  1. Laser and Plasma Research Institute, Shahid Beheshti University, Tehran 1983963113 (Iran, Islamic Republic of)
Publication Date:
OSTI Identifier:
22408153
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; COLLISIONS; COMPUTERIZED SIMULATION; ELECTRON DENSITY; ELECTRON EMISSION; ION DENSITY; ION IMPLANTATION; MONTE CARLO METHOD; PLASMA; PULSE RISE TIME; TIME DEPENDENCE