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Title: Electron heating in low pressure capacitive discharges revisited

The electrons in capacitively coupled plasmas (CCPs) absorb energy via ohmic heating due to electron-neutral collisions and stochastic heating due to momentum transfer from high voltage moving sheaths. We use Particle-in-Cell (PIC) simulations to explore these heating mechanisms and to compare the PIC results with available theories on ohmic and stochastic heating. The PIC results for ohmic heating show good agreement with the ohmic heating calculation of Lafleur et al. [Phys. Plasmas 20, 124503 (2013)]. The PIC results for stochastic heating in low pressure CCPs with collisionless sheaths show good agreement with the stochastic heating model of Kaganovich et al. [IEEE Trans. Plasma Sci. 34, 696 (2006)], which revises the hard wall asymptotic model of Lieberman [IEEE Trans. Plasma Sci. 16, 638 (1988)] by taking current continuity and bulk oscillation into account.
Authors:
; ;  [1]
  1. Department of Electrical Engineering and Computer Sciences University of California, Berkeley, California 94720 (United States)
Publication Date:
OSTI Identifier:
22407950
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 21; Journal Issue: 12; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; COMPUTERIZED SIMULATION; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRONS; FIRST WALL; HEATING; MOMENTUM TRANSFER; OSCILLATIONS; PLASMA; PLASMA SHEATH; PRESSURE RANGE KILO PA; STOCHASTIC PROCESSES