Uniform surface growth of copper oxide nanowires in radiofrequency plasma discharge and limiting factors
- Jozef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana (Slovenia)
- Plasma Laboratory, National Aerospace University “KhAI,” Kharkov 61070 (Ukraine)
- CSIRO Manufacturing, P.O. Box 218, Lindfield, NSW 2070 (Australia)
The uniform growth of copper oxide nanowires on the top of copper plate has been investigated during the exposure to radiofrequency plasma discharge in respect to plasma properties and its localization. The copper samples of 10 mm radius and 1 mm in thickness were exposed to argon-oxygen plasma created at discharge power of 150 W. After 10 min, almost uniform growth of nanowires was achieved over large surface. There were significant distortions in nanowire length and shape near the edges. Based on the experimental results, we developed a theoretical model, which took into account a balance in heat released at the flow of the current to the nanowire and rejected from the nanowire. This model established a dependence of the maximal length of the nanowire at dependence on the plasma parameters, where the limiting factor for nanowire growth and distortions in distribution are ballistic effects of ions and their local fluxes. In contrast, the plasma heating by potential interactions of species has very little influence on the length and smaller deviations in flux are allowed for uniformity of growth.
- OSTI ID:
- 22403296
- Journal Information:
- Physics of Plasmas, Vol. 21, Issue 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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