Power dependence of electron density at various pressures in inductively coupled plasmas
- Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
- Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn–like distribution.
- OSTI ID:
- 22403295
- Journal Information:
- Physics of Plasmas, Vol. 21, Issue 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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