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Title: Power dependence of electron density at various pressures in inductively coupled plasmas

Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25 W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn–like distribution.
Authors:
;  [1] ; ; ; ;  [2]
  1. Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
  2. Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22403295
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 21; Journal Issue: 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; DISTRIBUTION; ELECTRON DENSITY; ELECTRONS; PLASMA; PROBABILITY; VARIATIONS