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Title: A compact quantum correction model for symmetric double gate metal-oxide-semiconductor field-effect transistor

A compact quantum correction model for a symmetric double gate (DG) metal-oxide-semiconductor field-effect transistor (MOSFET) is investigated. The compact quantum correction model is proposed from the concepts of the threshold voltage shift (ΔV{sub TH}{sup QM}) and the gate capacitance (C{sub g}) degradation. First of all, ΔV{sub TH}{sup QM} induced by quantum mechanical (QM) effects is modeled. The C{sub g} degradation is then modeled by introducing the inversion layer centroid. With ΔV{sub TH}{sup QM} and the C{sub g} degradation, the QM effects are implemented in previously reported classical model and a comparison between the proposed quantum correction model and numerical simulation results is presented. Based on the results, the proposed quantum correction model can be applicable to the compact model of DG MOSFET.
Authors:
; ;  [1]
  1. Department of Electrical and Electronic Engineering, 50 Yonsei-ro, Seodaemun-gu, Yonsei University, Seoul 120-749 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22402602
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 17; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CAPACITANCE; COMPUTERIZED SIMULATION; CORRECTIONS; ELECTRIC POTENTIAL; LAYERS; METALS; MOSFET; OXIDES; QUANTUM MECHANICS; SEMICONDUCTOR MATERIALS; SYMMETRY