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Title: Substrate-dependent thermal conductivity of aluminum nitride thin-films processed at low temperature

In this paper, we report on investigation concerning the substrate-dependent thermal conductivity (k) of Aluminum Nitride (AlN) thin-films processed at low temperature by reactive magnetron sputtering. The thermal conductivity of AlN films grown at low temperature (<200 °C) on single-crystal silicon (Si) and amorphous silicon nitride (SiN) with thicknesses ranging from 100 nm to 4000 nm was measured with the transient hot-strip technique. The k values for AlN films on SiN were found significantly lower than those on Silicon consistently with their microstructures revealed by X-ray diffraction, high resolution scanning electron microscopy, and transmission electron microscopy. The change in k was due to the thermal boundary resistance found to be equal to 10 × 10{sup −9} Km{sup 2}W{sup −1} on SiN against 3.5 × 10{sup −9} Km{sup 2}W{sup −1} on Si. However, the intrinsic thermal conductivity was determined with a value as high as 200 Wm{sup −1}K{sup −1} whatever the substrate.
Authors:
 [1] ;  [2] ; ; ; ; ;  [1] ;  [3]
  1. Institut des Matériaux Jean Rouxel (IMN), University of Nantes, 2 rue de la Houssinière BP 32229, 44322 Nantes cedex 3 (France)
  2. (LMI), Université Constantine 1, Faculté des Sciences de la Technologie, Route de Ain El Bey, Constantine 25017 (Algeria)
  3. Department of Physics and Astronomy at College of Science, King Saud University at Riyadh (Saudi Arabia)
Publication Date:
OSTI Identifier:
22402397
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM NITRIDES; MAGNETRONS; MICROSTRUCTURE; MONOCRYSTALS; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDES; SUBSTRATES; THERMAL BOUNDARY RESISTANCE; THERMAL CONDUCTIVITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION