skip to main content

SciTech ConnectSciTech Connect

Title: Coexistence of colossal stress and texture gradients in sputter deposited nanocrystalline ultra-thin metal films

This paper demonstrates experimentally that ultra-thin, nanocrystalline films can exhibit coexisting colossal stress and texture depth gradients. Their quantitative determination is possible by X-ray diffraction experiments. Whereas a uniform texture by itself is known to generally cause curvature in so-called sin{sup 2}ψ plots, it is shown that the combined action of texture and stress gradients provides a separate source of curvature in sin{sup 2}ψ plots (i.e., even in cases where a uniform texture does not induce such curvature). On this basis, the texture and stress depth profiles of a nanocrystalline, ultra-thin (50 nm) tungsten film could be determined.
Authors:
 [1] ;  [2] ;  [2] ;  [3]
  1. Department of Metallurgical and Materials Engineering, Middle East Technical University, Dumlupinar Bulv. No. 1, 06800 Ankara (Turkey)
  2. Max Planck Institute for Intelligent Systems, Heisenbergstrasse 3, D-70569 Stuttgart (Germany)
  3. (Germany)
Publication Date:
OSTI Identifier:
22402395
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 77 NANOSCIENCE AND NANOTECHNOLOGY; CRYSTALS; DEPOSITS; FILMS; NANOSTRUCTURES; SPUTTERING; STRESSES; TEXTURE; TUNGSTEN; X-RAY DIFFRACTION