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Title: Formation of a hybrid plasmonic waveguide mode probed by dispersion measurement

Hybrid waveguides, i.e., dielectric waveguides combined with plasmonic waveguides, have great potential for concomitantly exhibiting subwavelength confinement and long range propagation, enabling a highly integrated photonic circuit. We report the characterization of hybrid waveguide modes excited in Si/SiO{sub 2}/Al films, by dispersion measurement using angle-resolved electron energy-loss spectroscopy. This experiment directly verifies the formation of the hybrid waveguide mode with a strongly localized electromagnetic field in a 6-nm-thick SiO{sub 2} layer. The results clearly describe the characteristic behavior of the hybrid waveguide mode, which depends on the effective index of the constituent dielectric waveguide and the surface plasmon-polariton modes.
Authors:
 [1] ;  [2] ;  [1]
  1. Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011 (Japan)
  2. (Japan)
Publication Date:
OSTI Identifier:
22399375
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 13; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ALUMINIUM; DIELECTRIC MATERIALS; ELECTROMAGNETIC FIELDS; ELECTRONS; ENERGY-LOSS SPECTROSCOPY; LAYERS; PLASMONS; POLARONS; PROBES; SILICON; SILICON OXIDES; SURFACES; THIN FILMS; WAVE PROPAGATION; WAVEGUIDES