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Title: Difference in charge transport properties of Ni-Nb thin films with native and artificial oxide

Here, we report on the properties of native and artificial oxide amorphous thin film on a surface of an amorphous Ni-Nb sample. Careful measurements of local current-voltage characteristics of the system Ni-Nb / NiNb oxide/Pt, were carried out in contact mode of an atomic force microscope. Native oxide showed n-type conductivity, while in the artificial one exhibited p-type one. The shape of current-voltage characteristic curves is unique in both cases and no analogical behavior is found in the literature. X-ray photoelectron spectroscopy (XPS) measurements were used to detect chemical composition of the oxide films and the oxidation state of the alloy components. Detailed analysis of the XPS data revealed that the structure of natural Ni-Nb oxide film consists of Ni-NbO{sub x} top layer and nickel enriched bottom layer which provides n-type conductivity. In contrast, in the artificial oxide film Nb is oxidized completely to Nb{sub 2}O{sub 5}, Ni atoms migrate into bulk Ni-Nb matrix. Electron depletion layer is formed at the Ni-Nb/Nb{sub 2}O{sub 5} interface providing p-type conductivity.
Authors:
 [1] ;  [2] ;  [3] ;  [4] ;  [5] ; ;  [6]
  1. Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, 1(2), Leninskie Gory, GSP-1, Moscow 119991 (Russian Federation)
  2. (Russian Federation)
  3. Department of General Physics and Nuclear Fusion, National Research University 'Moscow Power Engineering Institute,' Moscow 111250 (Russian Federation)
  4. National University of Science and Technology “MISiS,” Moscow 119049 (Russian Federation)
  5. Chalmers University of Technology, Göteborg 41296 (Sweden)
  6. WPI Advanced Institute for Materials Research, Tohoku University, Sendai 980-8577 (Japan)
Publication Date:
OSTI Identifier:
22399362
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 12; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ATOMIC FORCE MICROSCOPY; CHARGE TRANSPORT; CHEMICAL COMPOSITION; DEPLETION LAYER; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRONS; INTERFACES; NICKEL; NIOBIUM; NIOBIUM OXIDES; SURFACES; THIN FILMS; VALENCE; X-RAY PHOTOELECTRON SPECTROSCOPY