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Title: H-treatment impact on conductive-filament formation and stability in Ta{sub 2}O{sub 5}-based resistive-switching memory cells

In this article, we evidence the lower formation energy and improved stability of the conductive filament (CF) formed in TiN\Ta{sub 2}O{sub 5}\Ta resistive-switching memory cells treated in NH{sub 3} atmosphere at 400 °C. This annealing treatment results in (i) lower forming voltage, (ii) lower CF resistance, and (iii) longer retention lifetime of the oxygen-vacancy (V{sub o}) chain constituting the CF. Atomistic insights into these processes are provided by ab initio calculations performed for hydrogen (H) species incorporated in non-stoichiometric Ta{sub 2}O{sub 5} supercells: (i) V{sub o} formation energy is reduced by the presence of H, (ii) V{sub o}-chain CF conductivity is increased by V{sub o} + OH complex formation, and (iii) V{sub o}-chain retention is strengthened by the stable V{sub o} + OH complex. As a result, efficient CF formation and excellent state stability are obtained after 15 days at 250 °C.
Authors:
; ;  [1] ; ; ;  [2]
  1. Imec, Kapeldreef 75, B-3001 Leuven (Belgium)
  2. Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States)
Publication Date:
OSTI Identifier:
22399347
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 12; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; AMMONIA; ANNEALING; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; FILAMENTS; FORMATION HEAT; HYDROGEN; LIFETIME; OXYGEN; PHASE STABILITY; RETENTION; STOICHIOMETRY; TANTALUM OXIDES; TITANIUM NITRIDES; VACANCIES