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Title: Surface-interface exploration of Mg deposited on Si(100) and oxidation effect on interfacial layer

Using scanning tunneling microscopy and spectroscopy, Auger electron spectroscopy, and low energy electron diffraction, we have studied the growth of Mg deposited on Si(100)-(2 × 1). Coverage from 0.05 monolayer (ML) to 3 ML was investigated at room temperature. The growth mode of the magnesium is a two steps process. At very low coverage, there is formation of an amorphous ultrathin silicide layer with a band gap of 0.74 eV, followed by a layer-by-layer growth of Mg on top of this silicide layer. Topographic images reveal that each metallic Mg layer is formed by 2D islands coalescence process on top of the silicide interfacial layer. During oxidation of the Mg monolayer, the interfacial silicide layer acts as diffusion barrier for the oxygen atoms with a decomposition of the silicide film to a magnesium oxide as function of O{sub 2} exposure.
Authors:
; ; ; ; ;  [1] ;  [2] ;  [3] ;  [4]
  1. Aix Marseille Univ, IM2NP, Fac Sci St Jérôme, F-13397 Marseille (France)
  2. Aix Marseille Univ, CINaM CNRS, F-13288 Marseille (France)
  3. CNRS, LAAS, 7 Avenue du Colonel Roche, F-31400 Toulouse (France)
  4. (France)
Publication Date:
OSTI Identifier:
22399091
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 2; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMS; AUGER ELECTRON SPECTROSCOPY; COALESCENCE; DECOMPOSITION; ELECTRON DIFFRACTION; ENERGY GAP; EV RANGE; INTERFACES; LAYERS; MAGNESIUM; MAGNESIUM OXIDES; OXIDATION; OXYGEN; SCANNING TUNNELING MICROSCOPY; SILICIDES; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS