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Title: Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching

A chlorine plasma etching-based method for the fabrication of high-performance chalcogenide-based integrated photonics on silicon substrates is presented. By optimizing the etching conditions, chlorine plasma is employed to produce extremely low-roughness etched sidewalls on waveguides with minimal penalty to propagation loss. Using this fabrication method, microring resonators with record-high intrinsic Q-factors as high as 450 000 and a corresponding propagation loss as low as 0.42 dB/cm are demonstrated in submicron chalcogenide waveguides. Furthermore, the developed chlorine plasma etching process is utilized to demonstrate fiber-to-waveguide grating couplers in chalcogenide photonics with high power coupling efficiency of 37% for transverse-electric polarized modes.
Authors:
; ;  [1] ; ;  [1] ;  [2] ;  [1] ;  [2]
  1. CREOL, The College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
22395745
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 11; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CHLORINE; COUPLING; EFFICIENCY; ETCHING; FABRICATION; FIBERS; LOSSES; OPTIMIZATION; PERFORMANCE; PLASMA; RESONATORS; ROUGHNESS; SILICON; SUBSTRATES; WAVEGUIDES