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Title: Performance enhancement of uncooled infrared focal plane array by integrating metamaterial absorber

This letter presents an infrared (IR) focal plane array (FPA) with metamaterial absorber (MMA) integrated to enhance its performance. A glass substrate, on which arrays of bimaterial cantilevers are fabricated as the thermal-sensitive pixels by a polyimide surface sacrificial process, is employed to allow the optical readout from the back side of the substrate. Whereas the IR wave radiates onto the FPA from the front side, which consequently avoids the energy loss caused by the silicon substrate compared with the previous works. This structure also facilitates the integration of MMA by introducing a layer of periodic square resonators atop the SiN{sub x} structural layer to form a metal/dielectric/metal stack with the gold mirror functioning as the ground plane. A comparative experiment was carried out on the FPAs that use MMA and ordinary SiN{sub x} as the absorbers, respectively. The performance improvement was verified by the evaluation of the absorbers as well as the imaging results of both FPAs.
Authors:
; ;  [1] ; ;  [2]
  1. National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871 (China)
  2. Beijing Key Lab for Precision Optoelectronic Measurement Instrument and Technology, School of Optoelectronics, Beijing Institute of Technology, Beijing, 100871 (China)
Publication Date:
OSTI Identifier:
22395743
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 11; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; COMPARATIVE EVALUATIONS; DIELECTRIC MATERIALS; ENERGY LOSSES; GLASS; GOLD; LAYERS; METAMATERIALS; MIRRORS; PERFORMANCE; PERIODICITY; READOUT SYSTEMS; RESONATORS; SILICON; SILICON NITRIDES; SUBSTRATES; SURFACES