In-situ ellipsometric characterization of the growth of porous anisotropic nanocrystalline ZnO layers
- Department of Materials of Functional Electronics (MFE), National Research University of Electronic Technology, Bld. 5, Pas. 4806, Zelenograd, Moscow 124498 (Russian Federation)
- Department of Quantum Physics and Nanoelectronics (QPN), National Research University of Electronic Technology, Bld. 5, Pas. 4806, Zelenograd, Moscow 124498 (Russian Federation)
ZnO films have increasingly been in the spotlight due to their largely varied electro-physical and optical properties. For several applications, porous anisotropic nanocrystalline layers are especially interesting. To study the growth kinetics of such films during different fabrication processes, a powerful non-destructive in-situ technique is required. In this work, both ex-situ and in-situ spectroscopic ellipsometry are used along with advanced modelling techniques that are able to take both the anisotropy and the porosity of the films into account. Scanning electron microscopy, along with nitrogen absorption methods for measuring porosity, validated the ellipsometric data and proposed model. The film, grown by chemical bath deposition, was monitored from around 700 to 1800 nm in thickness. This same principle can now be used to monitor any other porous and/or anisotropic structure in an effective in-situ manner, e.g., growth of porous anodic aluminium oxides, nano-porous silica films, etc.
- OSTI ID:
- 22395701
- Journal Information:
- Applied Physics Letters, Vol. 106, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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