skip to main content

Title: Ion beam modification of topological insulator bismuth selenide

We demonstrate chemical doping of a topological insulator Bi{sub 2}Se{sub 3} using ion implantation. Ion beam-induced structural damage was characterized using grazing incidence X-ray diffraction and transmission electron microscopy. Ion damage was reversed using a simple thermal annealing step. Carrier-type conversion was achieved using ion implantation followed by an activation anneal in Bi{sub 2}Se{sub 3} thin films. These two sets of experiments establish the feasibility of ion implantation for chemical modification of Bi{sub 2}Se{sub 3}, a prototypical topological insulator. Ion implantation can, in principle, be used for any topological insulator. The direct implantation of dopants should allow better control over carrier concentrations for the purposes of achieving low bulk conductivity. Ion implantation also enables the fabrication of inhomogeneously doped structures, which in turn should make possible new types of device designs.
Authors:
; ; ;  [1] ; ; ; ;  [2] ; ; ;  [3]
  1. Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 (United States)
  2. Sandia National Laboratories, P.O. Box 969, Livermore, California 94551 (United States)
  3. Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854 (United States)
Publication Date:
OSTI Identifier:
22395532
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 24; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANNEALING; BISMUTH; BISMUTH SELENIDES; CHARGE CARRIERS; CONCENTRATION RATIO; DOPED MATERIALS; ELECTRIC CONDUCTIVITY; FABRICATION; ION BEAMS; ION IMPLANTATION; MODIFICATIONS; THIN FILMS; TOPOLOGY; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION